I-Atomic layer Deposition (ALD) ubuchwepheshe bokufakwa komhwamuko wamakhemikhali obukhulisa ungqimba lwamafilimu amancanyana ngongqimba ngokujova ngokushintshana ama-molecule andulelayo amabili noma ngaphezulu. I-ALD inezinzuzo zokulawula okuphezulu nokufana, futhi ingasetshenziswa kabanzi kumadivayisi we-semiconductor, amadivaysi e-optoelectronic, amadivaysi okugcina amandla nezinye izinkambu. Izimiso eziyisisekelo ze-ALD zihlanganisa i-precursor adsorption, ukusabela kwendawo kanye nokususwa ngomkhiqizo, kanye nezinto zokwendlalelo eziningi zingakhiwa ngokuphinda lezi zinyathelo emjikelezweni. I-ALD inezici nezinzuzo zokulawuleka okuphezulu, ukufana, kanye nesakhiwo esingenazimbobo, futhi ingasetshenziselwa ukubeka izinto ezihlukahlukene ze-substrate nezinto ezihlukahlukene.
I-ALD inezici nezinzuzo ezilandelayo:
1. Ukulawulwa okuphezulu:Njengoba i-ALD iyinqubo yokukhula kwesendlalelo ngesendlalelo, ukujiya nokwakheka kongqimba ngalunye lwento kungalawulwa ngokunembile.
2. Ukufana:I-ALD ingafaka izinto ngendlela efanayo kuyo yonke indawo engaphansi, igweme ukungalingani okungenzeka kobunye ubuchwepheshe bokubekwa.
3. Isakhiwo esingenambobo:Njengoba i-ALD ifakwe kumayunithi e-athomu eyodwa noma i-molecule eyodwa, ifilimu ewumphumela ngokuvamile inokwakheka okuminyene, okungenayo i-porous.
4. Ukusebenza okuhle kokuhlanganisa:I-ALD ingamboza ngempumelelo izakhiwo ze-aspect ratio ephezulu, njenge-nanopore arrays, izinto eziphezulu ze-porosity, njll.
5. Ukuqina:I-ALD ingasetshenziselwa izinto ezihlukahlukene ze-substrate, okuhlanganisa izinsimbi, ama-semiconductors, ingilazi, njll.
6. Ukuhlukahluka:Ngokukhetha ama-molecule ahlukene angaphambili, izinhlobonhlobo zezinto ezihlukahlukene zingafakwa kunqubo ye-ALD, njengama-oxide ensimbi, ama-sulfide, ama-nitrides, njll.