INGXENYE/1 CVD (Chemical Vapor Deposition) indlela: Ku-900-2300℃, kusetshenziswa i-TaCl5 ne-CnHm njengemithombo ye-tantalum nekhabhoni, i-H₂ njengesimo esinciphisayo, i-Ar₂njengegesi yesithwali, ifilimu ye-reaction deposition. I-coating elungiselelwe i-compact, iyunifomu nokuhlanzeka okuphezulu. Nokho, kukhona abanye ochwepheshe...
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