Ifilimu ye-Silicon

Incazelo emfushane:

I-Silicon Film ka-Semicera iyinto esebenza kahle kakhulu eyenzelwe izinhlelo zokusebenza ezithuthukile ezimbonini ze-semiconductor kanye ne-electronics. Yenziwe nge-silicon yekhwalithi ephezulu, le filimu ihlinzeka ngokufana okuyingqayizivele, ukuzinza okushisayo, kanye nezakhiwo zikagesi, okuyenza ibe yisixazululo esifanelekile sokufakwa kwefilimu emincane, i-MEMS (I-Micro-Electro-Mechanical Systems), kanye nokwakhiwa kwedivayisi ye-semiconductor.


Imininingwane Yomkhiqizo

Omaka bomkhiqizo

Ifilimu ye-Silicon ka-Semicera iwumsebenzi wekhwalithi ephezulu, onembile-obunjiniyela oklanyelwe ukuhlangabezana nezidingo eziqinile zemboni ye-semiconductor. Ikhiqizwe nge-silicon emsulwa, lesi sixazululo sefilimu elincanyana sinikeza ukufana okuhle kakhulu, ukuhlanzeka okuphezulu, kanye nezakhiwo ezihlukile zikagesi nezishisayo. Ilungele ukusetshenziswa ezinhlelweni ezahlukene ze-semiconductor, okuhlanganisa ukukhiqizwa kwe-Si Wafer, i-SiC Substrate, i-SOI Wafer, i-SiN Substrate, ne-Epi-Wafer. Ifilimu ye-Silicon ye-Semicera iqinisekisa ukusebenza okuthembekile nokungaguquguquki, iyenze ibe yinto ebalulekile yama-microelectronics athuthukile.

Ikhwalithi Ephakeme Nokusebenza Kokukhiqiza I-Semiconductor

Ifilimu ye-Silicon ye-Semicera yaziwa ngamandla ayo emishini avelele, ukuzinza okuphezulu kokushisa, namazinga aphansi amaphutha, konke okubalulekile ekwakhiweni kwama-semiconductors asebenza kahle kakhulu. Kungakhathaliseki ukuthi isetshenziswa ekukhiqizweni kwemishini ye-Gallium Oxide (Ga2O3), i-AlN Wafer, noma i-Epi-Wafers, ifilimu inikeza isisekelo esiqinile sokufakwa kwefilimu emincane kanye nokukhula kwe-epitaxial. Ukuhambisana kwayo namanye ama-semiconductor substrates afana ne-SiC Substrate kanye ne-SOI Wafers kuqinisekisa ukuhlanganiswa okungenamthungo ezinqubweni ezikhona zokukhiqiza, okusiza ukugcina ukuvunwa okuphezulu kanye nekhwalithi yomkhiqizo engaguquki.

Izicelo embonini ye-Semiconductor

Embonini ye-semiconductor, i-Semicera's Silicon Film isetshenziswa ezinhlobonhlobo zezinhlelo zokusebenza, kusukela ekukhiqizweni kwe-Si Wafer ne-SOI Wafer kuya ekusetshenzisweni okukhethekile okufana nokwakhiwa kwe-SiN Substrate kanye ne-Epi-Wafer. Ukuhlanzeka okuphezulu nokunemba kwale filimu kuyenza ibaluleke kakhulu ekukhiqizweni kwezingxenye ezithuthukile ezisetshenziswa kukho konke kusuka kuma-microprocessors namasekethe ahlanganisiwe kuya kumadivayisi we-optoelectronic.

Ifilimu ye-Silicon idlala indima ebalulekile ezinqubweni ze-semiconductor ezifana nokukhula kwe-epitaxial, i-wafer bonding, kanye nokufakwa kwefilimu encane. Izakhiwo zayo ezinokwethenjelwa zibaluleke kakhulu ezimbonini ezidinga izindawo ezilawulwa kakhulu, njengezindlu ezihlanzekile ezindwangu ze-semiconductor. Ukwengeza, i-Silicon Film ingahlanganiswa ezinhlelweni zamakhasethi ukuze kuphathwe kahle i-wafer nokuthutha ngesikhathi sokukhiqiza.

Ukuthembeka Kwesikhathi Eside Nokungaguquguquki

Enye yezinzuzo ezibalulekile zokusebenzisa i-Semicera's Silicon Film ukwethembeka kwayo kwesikhathi eside. Ngokuhlala kwayo okuhle kakhulu nekhwalithi engaguquki, le filimu inikeza isisombululo esinokwethenjelwa sezindawo zokukhiqiza ezinomthamo ophezulu. Kungakhathaliseki ukuthi isetshenziswa kumadivayisi we-semiconductor anembe kakhulu noma izinhlelo zokusebenza ze-elekthronikhi ezithuthukisiwe, Ifilimu Ye-Silicon ye-Semicera iqinisekisa ukuthi abakhiqizi bangakwazi ukufeza ukusebenza okuphezulu nokuthembeka kuyo yonke imikhiqizo eminingi.

Kungani Khetha Ifilimu Ye-Silicon ye-Semicera?

Ifilimu ye-Silicon evela ku-Semicera iyinto ebalulekile ekusetshenzisweni okuphambili embonini ye-semiconductor. Izakhiwo zayo ezisebenza kahle kakhulu, okuhlanganisa ukuzinza okuhle kakhulu kokushisa, ukuhlanzeka okuphezulu, namandla emishini, kuyenza ibe yinketho ekahle kubakhiqizi abafuna ukufeza izindinganiso eziphakeme kakhulu zokukhiqiza i-semiconductor. Kusukela ku-Si Wafer ne-SiC Substrate kuya ekukhiqizweni kwamadivayisi e-Gallium Oxide Ga2O3, le filimu iletha ikhwalithi nokusebenza okungenakuqhathaniswa.

Ngefilimu ye-Silicon ye-Semicera, ungathembela emkhiqizweni ohlangabezana nezidingo zokwenziwa kwe-semiconductor yesimanje, okunikeza isisekelo esithembekile sesizukulwane esilandelayo sama-electronics.

Izinto

Ukukhiqiza

Ucwaningo

Dummy

I-Crystal Parameters

I-Polytype

4H

Iphutha lokuma kobuso

<11-20 >4±0.15°

Amapharamitha kagesi

I-Dopant

n-uhlobo lweNitrojeni

Ukungazweli

0.015-0.025ohm · cm

Mechanical Parameters

Ububanzi

150.0±0.2mm

Ubukhulu

350±25 μm

Umumo oyisicaba oyinhloko

[1-100]±5°

Ubude obuyisicaba obuyisisekelo

47.5±1.5mm

Ifulethi lesibili

Lutho

I-TTV

≤5 μm

≤10 μm

≤15 μm

I-LTV

≤3 μm(5mm*5mm)

≤5 μm(5mm*5mm)

≤10 μm(5mm*5mm)

Khothama

-15μm ~ 15μm

-35μm ~ 35μm

-45μm ~ 45μm

I-Wap

≤35 μm

≤45 μm

≤55 μm

Front(Si-face) roughness(AFM)

I-Ra≤0.2nm (5μm*5μm)

Isakhiwo

Ukuminyana kwe-Micropipe

<1 eya/cm2

<10 kwe/cm2

<15 kwe/cm2

Ukungcola kwensimbi

≤5E10 ama-athomu/cm2

NA

I-BPD

≤1500 i-e/cm2

≤3000 i-e/cm2

NA

I-TSD

≤500 i-e/cm2

≤1000 i-e/cm2

NA

Ikhwalithi Yangaphambili

Ngaphambili

Si

Ukuqedwa kobuso

I-Si-face CMP

Izinhlayiya

≤60ea/wafer (usayizi≥0.3μm)

NA

Ukuklwebheka

≤5ea/mm. Ubude obuqongelelwe ≤Ububanzi

Ubude obuqongelelwe≤2*Ububanzi

NA

Ikhasi eliwolintshi/imigodi/amabala/ama-striations/ imifantu/ukungcola

Lutho

NA

Ama-Edge chips/indents/fracture/hex plate

Lutho

Izindawo ze-Polytype

Lutho

Indawo eqoqiwe≤20%

Indawo eqoqiwe≤30%

Ukumaka kwe-laser yangaphambili

Lutho

Ikhwalithi Emuva

Emuva ekupheleni

C-face CMP

Ukuklwebheka

≤5ea/mm, Ubude obuqongelelayo≤2*Ububanzi

NA

Ukukhubazeka kwasemuva (ama-edge chips/indents)

Lutho

Ukuhwalala emuva

I-Ra≤0.2nm (5μm*5μm)

Ukumaka kwe-laser emuva

1 mm (kusuka emaphethelweni aphezulu)

Umphetho

Umphetho

I-Chamfer

Ukupakisha

Ukupakisha

I-Epi-ilungile ngokufakwa kwe-vacuum

Ukupakishwa kwekhasethi le-multi-wafer

*Amanothi: "NA" kusho ukuthi asikho isicelo Izinto ezingashiwongo zingabhekisa ku-SEMI-STD.

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Ama-wafers e-SiC

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