I-Semiconductor Epitaxial Reactor ene-SiC Coating in Semiconductor

Incazelo emfushane:

I-Semicera inikeza uhla olubanzi lwezixhumi nezinto ze-graphite eziklanyelwe ama-epitaxy reactor ahlukahlukene.

Ngobambiswano lwamasu nama-OEM ahamba phambili embonini, ubungcweti bezinto ezibonakalayo, namandla okukhiqiza athuthukile, i-Semicera iletha imiklamo eklanyelwe ukuhlangabezana nezidingo ezithile zohlelo lwakho lokusebenza.Ukuzibophezela kwethu ekusebenzeni kahle kuqinisekisa ukuthi uthola izixazululo eziphelele zezidingo zakho ze-epitaxy reactor.

 

Imininingwane Yomkhiqizo

Omaka bomkhiqizo

Inkampani yethu ihlinzekaUkufakwa kwe-SiCizinqubo zezinsizakalo ebusweni be-graphite, izitsha zobumba nezinye izinto ngendlela ye-CVD, ukuze amagesi akhethekile aqukethe i-carbon ne-silicon akwazi ukusabela ekushiseni okuphezulu ukuze athole ama-molecule e-Sic ahlanzekile kakhulu, angafakwa phezu kwezinto ezimboziwe ukuze enzeIsendlalelo sokuvikela se-SiCyohlobo lwe-epitaxy barrel i-hy pnotic.

 

Izici eziyinhloko:

1 .Ukuhlanzeka okuphezulu kwe-SiC ehlanganiswe ne-graphite

2. Ukumelana nokushisa okuphezulu & ukufana okushisayo

3. KuhleI-SiC crystal coatedindawo ebushelelezi

4. Ukuqina okuphezulu ngokumelene nokuhlanza amakhemikhali

 
I-Barel Susceptor ene-SiC Coating in Semiconductor

Imininingwane Eyinhloko yeI-CVD-SIC Coating

Izakhiwo ze-SiC-CVD

Isakhiwo Sekristalu I-FCC β isigaba
Ukuminyana g/cm³ 3.21
Ukuqina Vickers ubulukhuni 2500
Usayizi Wokusanhlamvu μm 2~10
I-Chemical Purity % 99.99995
Amandla Okushisa J·kg-1 ·K-1 640
I-Sublimation Temperature 2700
Amandla E-Felexural I-MPa (RT 4-point) 415
I-Young's Modulus I-Gpa (4pt bend, 1300℃) 430
I-Thermal Expansion (CTE) 10-6K-1 4.5
I-Thermal conductivity (W/mK) 300

 

 
2--cvd-sic-purity---99-99995-_60366
5----sic-crystal_242127
Semicera Indawo yokusebenza
Indawo yokusebenza ye-Semicera 2
Umshini wezinsimbi
Ukucutshungulwa kwe-CNN, ukuhlanza amakhemikhali, i-CVD coating
Inkonzo yethu

  • Okwedlule:
  • Olandelayo: