I-SiC-Coated Epitaxial Reactor Barel

Incazelo emfushane:

I-Semicera inikeza uhla olubanzi lwezixhumi nezinto ze-graphite eziklanyelwe ama-epitaxy reactor ahlukahlukene.

Ngobambiswano lwamasu nama-OEM ahamba phambili embonini, ubungcweti bezinto ezibonakalayo, namandla okukhiqiza athuthukile, i-Semicera iletha imiklamo eklanyelwe ukuhlangabezana nezidingo ezithile zohlelo lwakho lokusebenza. Ukuzibophezela kwethu ekusebenzeni kahle kuqinisekisa ukuthi uthola izixazululo eziphelele zezidingo zakho ze-epitaxy reactor.

 

 


Imininingwane Yomkhiqizo

Omaka bomkhiqizo

Incazelo

Inkampani yethu ihlinzekaUkufakwa kwe-SiCizinqubo zezinsizakalo ebusweni be-graphite, izitsha zobumba nezinye izinto ngendlela ye-CVD, ukuze amagesi akhethekile aqukethe i-carbon ne-silicon akwazi ukusabela ekushiseni okuphezulu ukuze athole ama-molecule e-Sic ahlanzekile kakhulu, angafakwa phezu kwezinto ezimboziwe ukuze enzeIsendlalelo sokuvikela se-SiCyohlobo lwe-epitaxy barrel i-hy pnotic.

 

sis (1)

si (2)

Izici Eziyinhloko

1. Ukumelana nokushisa okuphezulu kwe-oxidation:
ukumelana ne-oxidation kusekuhle kakhulu lapho izinga lokushisa liphezulu njenge-1600 C.
2. Ukuhlanzeka okuphezulu : okwenziwe yi-chemical vapor deposition ngaphansi kwesimo sokushisa okuphezulu kwe-chlorination.
3. Ukumelana nokuguguleka: ubulukhuni obuphezulu, indawo ehlangene, izinhlayiya ezinhle.
4. Ukumelana nokugqwala: i-asidi, i-alkali, usawoti kanye nama-organic reagents.

Ukucaciswa Okuyinhloko kwe-CVD-SIC Coating

Izakhiwo ze-SiC-CVD
Isakhiwo Sekristalu I-FCC β isigaba
Ukuminyana g/cm³ 3.21
Ukuqina Vickers ubulukhuni 2500
Usayizi Wokusanhlamvu μm 2~10
I-Chemical Purity % 99.99995
Amandla Okushisa J·kg-1 ·K-1 640
I-Sublimation Temperature 2700
Amandla E-Felexural I-MPa (RT 4-point) 415
I-Modulus Encane I-Gpa (4pt bend, 1300℃) 430
I-Thermal Expansion (CTE) 10-6K-1 4.5
I-Thermal conductivity (W/mK) 300
Semicera Indawo yokusebenza
Indawo yokusebenza ye-Semicera 2
Umshini wezinsimbi
Ukucubungula kwe-CNN, ukuhlanzwa kwamakhemikhali, i-CVD coating
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