I-Graphite Susceptctor ene-Silicon Carbide Coating, ithreyi ye-Barrel

Incazelo emfushane:

I-Semicera inikeza uhla olubanzi lwezixhumi nezinto ze-graphite eziklanyelwe ama-epitaxy reactor ahlukahlukene.

Ngobambiswano lwamasu nama-OEM ahamba phambili embonini, ubungcweti bezinto ezibonakalayo, namandla okukhiqiza athuthukile, i-Semicera iletha imiklamo eklanyelwe ukuhlangabezana nezidingo ezithile zohlelo lwakho lokusebenza.Ukuzibophezela kwethu ekusebenzeni kahle kuqinisekisa ukuthi uthola izixazululo eziphelele zezidingo zakho ze-epitaxy reactor.

 

Imininingwane Yomkhiqizo

Omaka bomkhiqizo

Incazelo

Inkampani yethu ihlinzeka ngezinsizakalo zenqubo yokuhlanganisa ye-SiC ngendlela ye-CVD ebusweni be-graphite, i-ceramics nezinye izinto, ukuze amagesi akhethekile aqukethe i-carbon ne-silicon aphendule ekushiseni okuphezulu ukuze athole ukuhlanzeka okuphezulu kwama-molecule e-SiC, ama-molecule afakwe ebusweni bezinto ezimboziwe, ukwakha isendlalelo sokuzivikela se-SIC.

mayelana (1)

mayelana (2)

Izici Eziyinhloko

1 .Ukuhlanzeka okuphezulu kwe-SiC ehlanganiswe ne-graphite

2. Ukumelana nokushisa okuphezulu & ukufana okushisayo

3. Ikristalu ye-SiC ecwebezelayo efakwe endaweni ebushelelezi

4. Ukuqina okuphezulu ngokumelene nokuhlanza amakhemikhali

Ukucaciswa Okuyinhloko kwe-CVD-SIC Coating

Izakhiwo ze-SiC-CVD
Isakhiwo Sekristalu I-FCC β isigaba
Ukuminyana g/cm³ 3.21
Ukuqina Vickers ubulukhuni 2500
Usayizi Wokusanhlamvu μm 2~10
I-Chemical Purity % 99.99995
Amandla Okushisa J·kg-1 ·K-1 640
I-Sublimation Temperature 2700
Amandla E-Felexural I-MPa (RT 4-point) 415
I-Young's Modulus I-Gpa (4pt bend, 1300℃) 430
I-Thermal Expansion (CTE) 10-6K-1 4.5
I-Thermal conductivity (W/mK) 300
Isiqephu 3
Isiqephu 1
Isiqephu 2
Isiqephu 4
Isiqephu 5
Semicera Indawo yokusebenza
Indawo yokusebenza ye-Semicera 2
Umshini wezinsimbi
Ukucutshungulwa kwe-CNN, ukuhlanza amakhemikhali, i-CVD coating
Inkonzo yethu

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